- lithography tool
- літографічне устаткування
English-Ukrainian dictionary of microelectronics. 2013.
English-Ukrainian dictionary of microelectronics. 2013.
Nanoimprint lithography — is a method of fabricating nanometer scale patterns. It is a simple nanolithography process with low cost, high throughput and high resolution. It creates patterns by mechanical deformation of imprint resist and subsequent processes. The imprint… … Wikipedia
Extreme ultraviolet lithography — (also known as EUV or EUVL ) is a next generation lithography technology using the 13.5 nm EUV wavelength. EUVL opticsEUVL is a significant departure from the deep ultraviolet lithography used today. All matter absorbs EUV radiation. Hence, EUV… … Wikipedia
Electron beam lithography — (often abbreviated as e beam lithography) is the practice of scanning a beam of electrons in a patterned fashion across a surface covered with a film (called the resist),cite book |last= McCord |first=M. A. |coauthors=M. J. Rooks |title=… … Wikipedia
Immersion lithography — is a photolithography resolution enhancement technique that replaces the usual air gap between the final lens and the wafer surface with a liquid medium that has a refractive index greater than one. The resolution is increased by a factor equal… … Wikipedia
machine tool — machine tooled, adj. a power operated machine, as a lathe, used for general cutting and shaping of metal and other substances. [1860 65] * * * Stationary, power driven machine used to cut, shape, or form materials such as metal and wood. Machine… … Universalium
Multiple patterning — is a class of technologies developed for photolithography to enhance the feature density. The simplest case of multiple patterning is double patterning, where a conventional lithography process is enhanced to produce double the expected number of … Wikipedia
Nanolithography — Part of a series of articles on Nanoelectronics Single molecule electronics … Wikipedia
Double patterning — is a class of technologies developed for photolithography to enhance the feature density. For the semiconductor industry, double patterning is the only lithography technique to be used for the 32 nm and 22 nm half pitch nodes in 2008 2009 and… … Wikipedia
Optical proximity correction — An illustration of optical proximity correction. The blue Γ like shape is what we d like printed on the wafer, in green is the shape after applying optical proximity correction, and the red contour is how the shape actually prints (quite close to … Wikipedia
Etec Systems, Inc. — Etec Systems was an American producer of Scanning Electron Microscopes, Electron Beam Lithography Tools, and Laser Beam Lithography Tools from 1970 until 2005. It was located in Hayward, California and Hillsboro, Oregon. Company History Etec… … Wikipedia
printmaking — /print may king/, n. the art or technique of making prints, esp. as practiced in engraving, etching, drypoint, woodcut or serigraphy. [1925 30; PRINT + MAKING] * * * Art form consisting of the production of images, usually on paper but… … Universalium